Issledovanie vliyaniya optimizatsii tekhnologicheskogo protsessa na nadezhnost' integral'nykh mikroskhem [Investigation of the effect of process optimization reliability of integrated circuits]
Authors
N. M. Prishchepa
Kiev Politechnic Institute, Kiev
S. N. Demenin
Kiev Politechnic Institute, Kiev
Keywords:
manufacturing process, diffusion, MOS transistor, reliability of chip
Abstract
The performed experimental studies of the effect of the optimization process of diffusion in the formation of the source and drain regions of the MOS transistor in the main electrical parameters and reliability of the chip.
Author Biographies
N. M. Prishchepa, Kiev Politechnic Institute, Kiev
